Jakub Haberko, Frank Scheffold
We report on the submicron-scale fabrication and characterization of isotropic photonic materials derived from hyperuniform point patterns using direct laser writing in a polymer photoresist. We study experimentally the microscopic structure by electron microscopy and small angle light scattering. Reducing the refractive index mismatch by toluene infiltration we find good agreement between the scattering data and numerical calculations based on a discrete dipole approximation. Our work demonstrates that it is possible to fabricate isotropic photonic materials on technologically relevant length scales.
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http://arxiv.org/abs/1209.1995
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